Spin on Hard-Mask Material - diagram, schematic, and image 08
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing | SpringerLink
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano
The micropatterns (first figure) can be achieved by | Chegg.com
Amorphous Carbon Hard Mask for Multiple Patterning Lithography | Semantic Scholar
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Spin-on Dual Hard Mask Material | JSR Micro, Inc.
KR101484568B1 - High etch-resistant carbon hard mask condensasion polymer and anti-reflection hard mask composition including same, and pattern-forming method of semiconductor device using same - Google Patents
Innovatively composite hard mask to feature sub-30 nm gate patterning - ScienceDirect
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
Microwaves101 | Photolithography 101
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
Etching characteristics of TiN used as hard mask in dielectric etch process: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena: Vol 24, No 5
Etching with a hard mask - Plasma Etching - Texas Powerful Smart
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